X-ray Fluorescence (XRF) analysis

X-ray Fluorescence (XRF) is widely used technique for materials analysis in industrial quality control, raw material analysis and research applications.

A source of x-rays is used to excite the atoms of the target material and the resulting emission of characteristic x-rays is observed using an energy dispersive x-ray fluorescence (ED-XRF) detector.

XRF is a very successful technique for detecting and quantifying trace elements in bulk materials and is widely used for checking product compliance with environmental regulations such as RoHS (Restriction of Hazardous Substances).

XRF analytical instruments range from large laboratory based systems through bench top to small handheld products. Special methods of XRF analysis may be used to provide greater levels of detail in the results:

Micro-XRF (µ-XRF or MXRF) uses an excitation x-ray beam which is highly focussed to a small spot allowing detailed analysis of small areas of the sample.

Total Reflection X-ray Fluorescence Analysis (TXRF) is a very low background technique which allows very low level trace elements to be quantified. A typical application is wafer surface contamination control in semiconductor chip manufacturing.

Similar studies may be made using synchrotron radiation (SR) instead of an x-ray tube. For SR-XRF monochromatic x-rays can be produced with high intensities.

For all types of X-Ray Fluorescence applications, RaySpec XRF SDD detectors offer high spectral quality, excellent resolution, and high peak to background ratios over a wide energy range employing sensors with active areas from 10 to 170mm².

To download a brochure select – RaySpec SDD detectors for XRF Applications